電漿精準離子能量分佈控制技術 2023/07/11

簡介 Introductions

整合多重物理耦合模擬分析，包含熱傳 / 氣流 / 電磁場 / 電漿 / 化學反應等，建立電漿製程反應數據資料庫且建構電漿診斷技術，包含蘭牟爾探針、GEA 離子能量分析模組及非侵入式射頻離子診斷等，以精準控制離子能量分佈，並優化加速電漿源開發時程。

Integrates multi-physics modeling techniques such as thermal, flow, E/M, chemical reaction to create plasma database, and to develop plasma diagnostic technology such as Langmuir probe, GEA ion energy analyzer and non-invasive rf ion measurement technologies, to control precise ion energy distribution and to optimize plasma source module design.

特色與創新 Characters and Innovations

• 傳統電漿模組單頻偏壓所產生離子能量分佈過寬（IED > 45 eV），無法滿足原子層級製程（ALE or ALD）所需。本創新技術建構偏壓混合波形調控模組，抑制電漿鞘層電位離散分佈，進而達到精準窄離子能量分佈 效果（IED < 15 eV）。
• Traditional plasma modules with single-frequency bias voltage produce ion energy distributions that are too broad（IED > 45 eV）to meet the requirements of atomic layer processes（ALE or ALD）. This innovative technology constructs a bias mixed waveform control module to suppress the discrete distribution of plasma sheath potential and achieve precise and narrow ion energy distribution（IED < 15 eV）.